隨著去年由牛津儀器主辦，中科院半導(dǎo)體所協(xié)辦的研討會(huì)成功舉行，吸引了110余名來自半導(dǎo)體領(lǐng)域的用戶。今年牛津儀器將再次在上海舉辦為期一天的納米級(jí)等離子研討會(huì).

      研討會(huì)設(shè)在Semicon 2012的前一天, 牛津儀器的國外應(yīng)用專家及國內(nèi)知名機(jī)構(gòu)的用戶將出席并發(fā)言.

      本次研討會(huì)主題與主講者如下:

??Introduction to ALD and its applications, including photovoltaics; Prof Erwin Kessels, University of Eindhoven (TU/e), Netherlands

??Etch & deposition process in the OPTO and MEMS application device; Dr. Chu Ann-Kuo, Professor of Department of Photonics, National Sun Yat-sen University, Taiwan

??Infrared Focal Plane Arrays (IRFPAs) detector for space applications; Dr. Zhenghua YE, SITP (Shanghai Institute of Technology Physics)

??Micro/Nano fabrication and characterization of Si field electron emitters; Guest Speaker: Dr. Juncong SHE, Sun Yat-Sen University, China

?? ALD used in the MEMS application; Jerry Wang, Manager of Microsystems Technology Center, ITRI, Taiwan

      牛津儀器等離子部的亞洲銷售經(jīng)理Jeffrey Seah先生將為這次研討會(huì)致開幕詞：“預(yù)計(jì)將有許多的觀眾參加這次的研討會(huì), 我們非常榮幸地邀請(qǐng)到了國內(nèi)知名機(jī)構(gòu)的用戶介紹他們?nèi)绾尾僮魇褂梦覀兊牡入x子工藝，同時(shí)還有機(jī)會(huì)與等離子工藝應(yīng)用專家們分享經(jīng)驗(yàn), 從而讓大家學(xué)習(xí)到更多的相關(guān)知識(shí)。”
   
      我們?cè)?011年取得了成功，今年的研討會(huì)也會(huì)有眾多知名的嘉賓到場(chǎng)并發(fā)表精彩演講，牛津儀器真誠地期待對(duì)等離子工藝的學(xué)術(shù)和生產(chǎn)有濃厚興趣的觀眾參加。